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NANOSENSORS

NANOSENSORS heads the world market with its innovative high quality scanning probes for SPM (Scanning Probe Microscopy) and AFM (Atomic Force Microscopy). NANOSENSORS' AFM probes, AFM tips and Cantilevers contribute to many scientific breakthroughs in Nanotechnology.

Accurate and rapid antibiotic susceptibility testing using a machine learning assisted nanomotion technology platform

Fig. 1 from Alexander Sturm et al. “Accurate and rapid antibiotic susceptibility testing using a machine learning-assisted nanomotion technology platform”: Nanomotion detection and recording platform. a Representation of the components of the nanomotion technology platform. b A representation of the nanomotion measurement setup with the (1) bacteria-loaded cantilever, (2) superluminescent light emitting diode (SLED) = light source, and (3) photodetector. c Schematic illustrating Gram-negative bacteria attached to the cantilever. Prior to attachment, bacteria are dispersed in gelling agarose while the cantilever surface is functionalized using positively charged poly-D-lysine. The gelling agent proved beneficial for an even distribution and stability of the bacterial attachment. d Representative standard 4-h nanomotion recordings with a 2-h medium phase (50% LB medium) followed by a 2-h drug phase with 32 µg/ml CRO for the E. coli reference strains ATCC-25922 (S, susceptible) and BAA-2452 (R, resistant). These recordings form the basis for using nanomotion to conduct AST. This study contains 219 recordings of ATCC-25922 and 225 recordings of BAA-2452 exposed to 32 µg/ml CRO with similar results. Data are available in the source data file. NANOSENSORSTM tipless uniqprobe AFM cantilevers SD-qp-CONT-TL from the NANOSENSORS Special Developments List were used.

Antimicrobial resistance (AMR) has become a significant threat to public health worldwide. * AMR diagnostic strategies such as antibiotic susceptibility testing (AST) help provide clinicians… Read More »Accurate and rapid antibiotic susceptibility testing using a machine learning assisted nanomotion technology platform

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and the dwell time impact on the etch profile and topographical changes in SiO2 substrates

Figure 4 from Aleksandra Szkudlarek et al 2024 “Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates” : Results of in situ AFM measurements of the etched lines on the SiO2/Si substrate as a function of the dwell time: A) AFM profiles of lines etched with different dwell times (td = 1, 10, and100 μs); B) 3D AFM image of the SiO2 surface. The AFM-in-SEM approach allows for in situ analysis. Thus, the graphene could be modified and immediately measured by AFM without changing the environment. The analysis was performed by using the tapping mode and the NANOSENSORS self-sensing self-actuating Akiyama probe.

Graphene is one of the most extensively studied 2D materials, exhibiting extraordinary mechanical and electronic properties. * Although many years have passed since its discovery,… Read More »Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and the dwell time impact on the etch profile and topographical changes in SiO2 substrates