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Room-temperature sub-100 nm Néel-type skyrmions in non-stoichiometric van der Waals ferromagnet Fe3-xGaTe2 with ultrafast laser writability

Fig. 4 from Zefang Li et al. (2024) “Room-temperature sub-100 nm Néel-type skyrmions in non-stoichiometric van der Waals ferromagnet Fe3-xGaTe2 with ultrafast laser writability”: Thickness-tunable skyrmions imaged by MFM. a Typical MFM images of RT skyrmions taken at different thicknesses and external magnetic fields. In these images, bright contrast in the images corresponds to spin down, while dark contrast corresponds to spin up relative to the sample normal direction. The inset shows the schematic for the MFM experiment with magnetic field perpendicular to the sample plane. b RT skyrmion diameter dsk versus sample thickness t at zero field. c Comparison for diameter dsk of field-free skyrmions and temperature T for various 2D vdW materials with a thickness around 100 nm, including Cr1+xTe234, Fe3-xGeTe255, Fe5GeTe224, (Fe0.5Co0.5)5GeTe231, and Fe2.84±0.05GaTe2 in this work. Error bars represent the standard error of skyrmion sizes averaged at various temperature. d Thickness and magnetic field dependence of RT skyrmion phase diagram. The color indicates the skyrmion density ρsk. The black dashed line shows the boundary between skyrmion and ferromagnetic phase. The magnetic force microscopy (MFM) measurements were performed with a commercially available Atomic Force Microscope and NANOSENSORSTM low-moment magnetic AFM tips PPP-LM-MFMR. The MFM measurements were carried out in an environment continuously flushed with argon gas to ensure effective protection.

The small size and magnetoelectronic properties of magnetic skyrmions make them promising candidates as data carriers for future high-density and fast-speed data storage, quantum and… Read More »Room-temperature sub-100 nm Néel-type skyrmions in non-stoichiometric van der Waals ferromagnet Fe3-xGaTe2 with ultrafast laser writability

Lipoplex-Functionalized Thin-Film Surface Coating Based on Extracellular Matrix Components as Local Gene Delivery System to Control Osteogenic Stem Cell Differentiation

Figure 5 from Catharina Husteden et al. 2023 “Lipoplex-Functionalized Thin-Film Surface Coating Based on Extracellular Matrix Components as Local Gene Delivery System to Control Osteogenic Stem Cell Differentiation”: A–D) Topography images [Cs/Col]4Cs (A), [Cs/Col]4Cs/LPX (B), [Cs/Col]4Cs/LPX/Cs (C), and [Cs/Col]4Cs/LPX/Cs/Col determined by AFM [Scale bar 1 µm] (D). E) Distribution curves of Young's modulus (E0) with a force map of a defined area (see also Figure S4, Supporting Information of the cited article). NANOSENSORSTM uniqprobe triangular qp-BioT AFM probes were used for the quantitative imaging to investigate the surface roughness and topography (in a standard liquid cell of a commercially available atomic force microscope) and force mapping. The uniqprobe qp-BioT AFM probe types offer an alternative to silicon nitride probes, with the advantage of taller AFM tips with smaller opening angles and reduced thermal drift.

The development of smart multifunctional biomaterials with the ability to control the behavior of stem cells on demand has become a powerful strategy in regenerative… Read More »Lipoplex-Functionalized Thin-Film Surface Coating Based on Extracellular Matrix Components as Local Gene Delivery System to Control Osteogenic Stem Cell Differentiation

Transparent electrodes based on molybdenum-titanium-oxide with increased water stability for use as hole-transport/hole-injection components

Figure 6 from Selina Goetz et al. 2022 “Transparent electrodes based on molybdenum–titanium–oxide with increased water stability for use as hole-transport/hole-injection components”: AFM images of a bare glass, b bare PET, c MTO40/Ag14/MTO10/30 on glass and d MTO40/Ag14/MTO10/30 on PET Figure 6 displays the 1 × 1 µm2 AFM images of the DMD on glass and PET, as well as the corresponding bare substrate. The roughness of the electrodes is mostly affected by the underlying substrate. The extracted root mean square value (RMS) for the glass substrate (Fig. 6a) is 1.8 ± 0.1 nm and 11.5 ± 4.0 nm for the PET substrate (Fig. 6b). The RMS values of the DMD electrodes are even reduced, yielding RMS = 1.0 ± 0.1 nm for glass/MTO40/Ag14/MTO10/30 (Fig. 6c) and RMS = 4.8 ± 2.0 nm for PET/MTO40/Ag14/MTO10/30 (Fig. 6d). NANOSENSORS silicon high-resolution AFM probes for tapping mode with a typical AFM tip radius of 2 nm ( SuperSharpSilicon™ SSS-NCHR ) were used.

The application of molybdenum oxide layers in electronic devices like solar cells and organic light emitting diodes (LEDs) has expanded considerably. * Dielectric/metal/dielectric (DMD) transparent… Read More »Transparent electrodes based on molybdenum-titanium-oxide with increased water stability for use as hole-transport/hole-injection components

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and the dwell time impact on the etch profile and topographical changes in SiO2 substrates

Figure 4 from Aleksandra Szkudlarek et al 2024 “Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates” : Results of in situ AFM measurements of the etched lines on the SiO2/Si substrate as a function of the dwell time: A) AFM profiles of lines etched with different dwell times (td = 1, 10, and100 μs); B) 3D AFM image of the SiO2 surface. The AFM-in-SEM approach allows for in situ analysis. Thus, the graphene could be modified and immediately measured by AFM without changing the environment. The analysis was performed by using the tapping mode and the NANOSENSORS self-sensing self-actuating Akiyama probe.

Graphene is one of the most extensively studied 2D materials, exhibiting extraordinary mechanical and electronic properties. * Although many years have passed since its discovery,… Read More »Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and the dwell time impact on the etch profile and topographical changes in SiO2 substrates