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Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers

It is always exiting to see what our creative and innovative users are doing with our AFM probes.

In their article “Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers” L. Forrer, A. Kamber, A. Knoll, M. Poggio and F. R. Braakman describe how they developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers. *

The authors even patterned the very fragile tip of the NANOSENSORS AdvancedTEC ATEC-NC with a gate array defined through the etching process after they modified the AFM tip using FIB milling. *

Their method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors. *

Figure 5 from L. Forrer et al. “Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers”:Scanning electron micrograph of the tipped end of the cantilever, patterned with a gate array defined through the etching process. The NANOSENSORS AdvancedTEC ATEC-NC AFM tip was first modified using FIB milling and then patterned with a gate array defined through the etching process

Figure 5 from L. Forrer et al. “Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers”:
Scanning electron micrograph of the tipped end of the cantilever, patterned with a gate array defined through the etching process.

 

 

*L. Forrer, A. Kamber, A. Knoll, M. Poggio and F. R. Braakman
Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers
AIP Advances 13, 035208 (2023)
DOI: https://doi.org/10.1063/5.0127665

Open Access: The article “Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers” by L. Forrer, A. Kamber, A. Knoll, M. Poggio, F. R. Braakman is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit https://creativecommons.org/licenses/by/4.0/.